Colloidal Silicon Dioxide |112945-52-5
Zogulitsa:
| Chitsanzo | malo enieni | Kuyimitsidwa pH | Kutaya pakuyanika | Kutaya pakuyatsa | SiO2(%) | kachulukidwe kachulukidwe (g/l) |
| Chithunzi cha CC-150 | 150 ± 15 | 3.9-4.5 | ≤1.0 | ≤2.0 | ≥99.8 | 28-35 |
| CC-200 | 200±20 | 3.9-4.5 | ≤1.0 | ≤2.0 | ≥99.8 | 28-35 |
| CC-300 | 300 ± 25 | 3.7-4.5 | ≤1.0 | ≤2.5 | ≥99.8 | 28-35 |
| Mtengo wa CC-380 | 380 ± 30 | 3.7-4.5 | ≤1.0 | ≤2.5 | ≥99.8 | 28-35 |
Mafotokozedwe Akatundu:
Colloidal silica ili ndi tinthu tating'onoting'ono, malo akuluakulu enieni, mawonekedwe a porous, mphamvu ya adsorption yamphamvu komanso kukhazikika kwachilengedwe ndi mankhwala.Kuwonjezera silika wa colloidal ku mankhwala amatha kugwiritsa ntchito mokwanira zinthuzi monga anti-caking agents, zonyamulira mankhwala ndi zowonjezera kuti akwaniritse cholinga chotalikitsa mphamvu ya mankhwala.
Phukusi:25 kgs / thumba kapena momwe mukufunira.
Posungira:Kusunga pa mpweya wokwanira, malo ouma.
Executive Standard:International Standard.
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